Atomic layer deposition (ALD) has received much interest since it was introduced with the name atomic layer epitaxy (ALE) in the late 1970s. ALD is based on sequential surface chemical reactions and ...
A technical paper titled “Quantified Uniformity and Selectivity of TiO 2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles” was published by researchers at IMEC, North ...
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