Electron lithography enables sub-100-nanometer patterning of a fully water-based hydrogel resist.

In order to produce the next generation of computer chips it is necessary to continue to shrink the size of the components on the chip. The miniaturization upon which Moore’s Law rests has been ...

JST (President, Michinari Hamaguchi) certified the successful development of a "Module for improvement of resist performance for lithography” (hereinafter referred to as "Resist Sensitization Module") ...

TOKYO — Tokyo Electron Limited is beginning to instruct users of its equipment on the use of a surfactant rinse that can prevent a problem with chip manufacturing at the 90-nm node; the collapse of ...

Most discussions of advanced lithography focus on three elements — the exposure system, photomasks, and photoresists — but that’s only part of the challenge. Successfully transferring a pattern from ...