Electron lithography enables sub-100-nanometer patterning of a fully water-based hydrogel resist.

New research paper entitled “Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement” from TEL Technology Center, Americas and IBM ...

The ability to create intricate, nano-scale patterns is at the heart of nanotechnology, and lithography techniques are the tools that make this possible. From photolithography to FIB, each technique ...

One of the main challenges in developing semiconductor chip technology is making electronic components smaller and more effective. This difficulty is most noticeable in lithography, which is the ...

What Is Electron Beam Lithography? Electron beam lithography (EBL) is a technique for creating high-resolution patterns on a semiconductor substrate by directing a beam of electrons to selectively ...

At last month's SPIE Advanced Lithography + Patterning Conference, Belgian electronics research center imec presented the latest results from its Joint High-NA Lab and the patterning ecosystem around ...

Fig. 1 The lithography process. The projection lithography system. The advancement of semiconductor manufacturing is a key driver of electronic device innovations. As Moore’s Law progresses, ...